Localization of metastable atom beams with optical standing waves: Nanolithography at the Heisenberg Limit.
Johnson, K.S.; Thywissen, J.H.; Dekker, N.H.; Berggren, K.K.; Chu, A.P.; Younkin, R.; Prentiss, M.; Science, 1998, vol. 280, issue 5369, p 1583, ISSN 00368075. ISBN 10959203.

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